Home > Applications > Inductively Coupled Plasma Etch

Inductively Coupled Plasma Etch

An inductively coupled plasma is induced by a coil wrapped around a quartz chamber, as opposed to planar etching between two parallel electrodes. Low frequency or Radio Frequency cycles through the coil at its designated frequency and induces plasma formation in the quartz chamber as it couples at opposite sides of the coil. Contact one of our process specialists at the systems division to help you qualify our equipment for your application.