Photoresist Strip

Photoresist is used in wafer fabrication to transfer a circuit pattern onto the wafer. Once the photoresist pattern is applied, it must be removed before the next fabrication step. Plasma stripping with dry chemistry is an environmentally friendly way of removing photoresist.

Wet chemistry may be used, but the danger and expense associated with handling wet chemicals are significant, and wet process leaves residues that can interfere with further processing.