Planar Etch

Planar etch is etching between two parallel electrodes, as opposed to an inductively coupled plasma induced by a coil. Anatech’s SCE series of aluminum plasma reactors are the latest additions to its product offerings. Whether you are doing R&D or full scale production runs there is a SCE-AL system designed for your application. No company in plasma can beat our design, quality or experience in delivering flexible, affordable systems. Contact one of our process specialists at the systems division to help you qualify our equipment for your application. Anatech offers laboratory services to help qualify its technologies for your applications. We extend these valuable services before and after ownership of our quality equipment.

Each of the SCE-AL system can be run in four planar plasma modes …..

• Direct…substrates can be placed on power or ground shelves for maximum planar effect.
• Directional…substrates requiring anisotropic etching can be placed on a special powered planar shelf.
• Down Stream …substrates can be placed on a neutral shelf for a gentle plasma effect.
• Custom…when parallel plate configurations are not optimal, special electrode configurations can be supplied.

Quartz Barrel Systems

Quartz barrel systems may be configured for planar plasma and directional modes.

Aluminum box systems may be configured for planar, directional, down stream and custom plasma modes.