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Inductively Coupled Plasma Etching

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An Inductively Coupled Plasma (ICP) is induced by a coil wrapped around a quartz chamber, as opposed to planar etching between two parallel electrodes.

Low frequency or Radio Frequency cycles through the coils at its designated 13.56 MHz. frequency and induces a gas plasma formation in the quartz chamber as it couples between opposite sides of the coil (see photo below).

Contact one of our process specialists at the systems division to help you qualify our equipment for your application.



Ignited Gas Plasma inside Quartz Chamber