Inductively Coupled Plasma Etching
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An Inductively Coupled Plasma (ICP) is induced by a coil wrapped around a quartz chamber, as opposed to planar etching between two parallel electrodes.
Low frequency or Radio Frequency cycles through the coils at its designated 13.56 MHz. frequency and induces a gas plasma formation in the quartz chamber as it couples between opposite sides of the coil (see photo below).
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Ignited Gas Plasma inside Quartz Chamber