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Hummer 12 Sputter System

Hummer® 12 RF and/or DC Sputter Systems for Insulators and Metals Thin Film Coatings

Sputter Chamber Assembly

Chamber

• Stainless steel with shields.
• 18" to 30" diameter.
• Sputter up, down or sideways configuration.

Substrate holder

• Stationary 2" diameter to rotating 8" diameter

Shutters

• Sputter sources manually shuttered for pre-clean target sputtering.
• Cross contamination shields between sources

Magnetron Sputter Guns

• Fixed angle stationary or adjustable in x,y and z axes.
• DC/RF 2" diameter to 8" diameter.
• Water cooled, require 0.5 to 1.5 gpm each at 20° C.
• Concurrent or consecutive sputter configuration

Vacuum System

• Two stage direct drive rotary pump with outlet filter.
• 350 lps to 1,000 lps turbomolecular pump.
• Cryo pump or diffusion pump optional.
• Manual vent and gas valves
• Gate valve, electro-pneumatic

Power Supplies

• 1000 Watt to 3500 Watt DC power supply
• 600 Watt to 5000 Watt RF power supply with automatic matching network

Control

• Auto vacuum sequencing
• Water and air interlock.
• End point by time.
  Vacuum gauging to 1x10-8 Torr.
• PLC control optional.
  Quartz thickness rate/thickness monitor optional.

Gas Inlet supply

• High precision manual gas control valve.
• Mass flow control optional.

Overall System

• All cabinet surfaces deburred and painted.
• All subassemblies inside cabinetry except water chiller.
• Power supply safety interlocked to vacuum.
• Water chiller/recirculator.
• Floor mount.