Hummer Box Chamber Coating Systems

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Thin Fim Deposition: "D" Style Box Chamber Systems.
Standard "Sputter-Down" configuration.
Optional: Sputter UP or Side configuration.

• Chambers:
  Systems are available in; 16, 20, 24 and 30-inch, "D"-style chamber sizes.
  Stainless steel chamber construction with aluminium door and 4-inch shuttered view port.
  Stainless Steel Interior Shielding 
  Ports for vacuum pumping and instrumentation.
  Sputter sources are 2, 3 and 4-inch diameter (based on system size or application).
  Sources are "Flex-Mounted" for variable angel of incidence 0-30 degrees.   Cooling is required for the souces. GPM is determined by source size and quantity 
  Optional: Multiple sources in Linear Design configuration available. 
   
  
• Controls:
  Siemens S7-200 series PLC based contro for  vacuum function and sputtering. Fully integrated "Touch-Panel" interface control pad for setting system parameters and diagnostics.
  Password protection.
  
  
• Safety:
  Safety interlocks for door, power, water and vacuum.
  
    
• Power Supply:
  RF generator 300-watts, 13.56 MHz standard.
  DC power 1500-watts.
  Optional: RF 600 or 1000 watts. DC power 2500-watts.
  
  
• Mass Flow Controller:
  Mass flow controls, 100 - SCCM. Up to three (3) gasses maximum.
  
  
• System Cooling:
  GPM - .8 to 10 Gallons
  
  
• Pumping:
  Remote located mechanical roughing pump can be placed outside the cleanroom environment.
  Turbomolecular pump external to the system chamber on rear pumping port.
  Optional:
  Cryogenic pump or larger pumps based on process requirements.
  Mechanical Pump: Oxygen Service Preparation to Class "B" Specification for reactive sputtering
  Dry Mechanical Pump - oil free 
  
  
• Electrical Requirements:
  208-240-VAC, 50/60 Hz., 40-75-Amps